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Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production
Alternative TitleCeram. Int.
Liu, Ran1,2,3; Xue, Tianyan1,2; Song, Jing1,2; Wang, Yu1,2; Qi, Tao1,2; Qu, Jingkui1,2; Du, Ailing3
2014-07-01
Source PublicationCERAMICS INTERNATIONAL
ISSN0272-8842
Volume40Issue:6Pages:8801-8808
AbstractThe efficiency of silicon removal technology by acid leaching and flocculation during zirconium oxychloride octahydrate (ZrOCl2 center dot 8 H2O) production has been improved. The optimum conditions of acid leaching were found to be as follows: transiton material, 300 g; HCl (6 mol/L), 600 mL; leaching time, 4 h; and leaching temperature, 100 degrees C. The nonionic polyoxyethylene lauryl ether (AEO9) was adopted as the flocculant. The optimum flocculation conditions were found to be as follows: temperature, 40 degrees C; flocculant amount, 10 ml (concentration 1%); time, 1 h. The zirconium oxychloride solution after purification contained 36 ppm SiO2 and 160 g/L ZrOCl2. The polymerization and flocculation mechanisms of silicic acid were analyzed. Results of Fourier-transform infrared, scanning electron microscopy, nuclear magnetic resonance, and Brunauer-Emmett-Teller analyses showed the main transformation and properties of the products in the acid leaching and flocculation processes. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.; The efficiency of silicon removal technology by acid leaching and flocculation during zirconium oxychloride octahydrate (ZrOCl2 center dot 8 H2O) production has been improved. The optimum conditions of acid leaching were found to be as follows: transiton material, 300 g; HCl (6 mol/L), 600 mL; leaching time, 4 h; and leaching temperature, 100 degrees C. The nonionic polyoxyethylene lauryl ether (AEO9) was adopted as the flocculant. The optimum flocculation conditions were found to be as follows: temperature, 40 degrees C; flocculant amount, 10 ml (concentration 1%); time, 1 h. The zirconium oxychloride solution after purification contained 36 ppm SiO2 and 160 g/L ZrOCl2. The polymerization and flocculation mechanisms of silicic acid were analyzed. Results of Fourier-transform infrared, scanning electron microscopy, nuclear magnetic resonance, and Brunauer-Emmett-Teller analyses showed the main transformation and properties of the products in the acid leaching and flocculation processes. (C) 2014 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
KeywordZirconium Oxychloride Acid Leaching Flocculation
SubtypeArticle
WOS HeadingsScience & Technology ; Technology
DOI10.1016/j.ceramint.2014.01.102
URL查看原文
Indexed BySCI
Language英语
WOS KeywordREVERSE-OSMOSIS MEMBRANES ; SURFACE-CHEMISTRY ; AMORPHOUS SILICA ; FUSION ; MODEL ; NMR
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Ceramics
WOS IDWOS:000335201800144
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Cited Times:8[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Version出版稿
Identifierhttp://ir.ipe.ac.cn/handle/122111/10941
Collection研究所(批量导入)
Affiliation1.Natl Engn Lab Hydromet Cleaner Prod Technol, Beijing 100190, Peoples R China
2.Chinese Acad Sci, Inst Proc Engn, Key Lab Green Proc & Engn, Beijing 100190, Peoples R China
3.Shandong Univ, Sch Chem & Chem Engn, Jinan 250100, Shandong, Peoples R China
Recommended Citation
GB/T 7714
Liu, Ran,Xue, Tianyan,Song, Jing,et al. Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production[J]. CERAMICS INTERNATIONAL,2014,40(6):8801-8808.
APA Liu, Ran.,Xue, Tianyan.,Song, Jing.,Wang, Yu.,Qi, Tao.,...&Du, Ailing.(2014).Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production.CERAMICS INTERNATIONAL,40(6),8801-8808.
MLA Liu, Ran,et al."Removal of silicon in acid leaching and flocculation processes during zirconium oxychloride octahydrate production".CERAMICS INTERNATIONAL 40.6(2014):8801-8808.
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