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The oxidation behavior of ultrafine SiC particles prepared by PCVD
Dai, X. G.; Zheng, G. L.; Rong, J. L.; Wang, J. G.
1996
Conference Name1996 China/Japan Symposium on Particuology
Source Publication'96 China-Japan Symposium on Particuology, Proceedings
Pages174-178
Conference DateMAY 24-25, 1996
Conference PlaceTSINGHUA UNIV, BEIJING, PEOPLES R CHINA
KeywordUltrafine Powder Sic Pcvd Oxidation Adsorption
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Language英语
Document Type会议论文
Identifierhttp://ir.ipe.ac.cn/handle/122111/11361
Collection生化工程国家重点实验室
Recommended Citation
GB/T 7714
Dai, X. G.,Zheng, G. L.,Rong, J. L.,et al. The oxidation behavior of ultrafine SiC particles prepared by PCVD[C],1996:174-178.
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