| The oxidation behavior of ultrafine SiC particles prepared by PCVD | |
| Dai, X. G.; Zheng, G. L.; Rong, J. L.; Wang, J. G. | |
| 1996 | |
| Conference Name | 1996 China/Japan Symposium on Particuology |
| Source Publication | '96 China-Japan Symposium on Particuology, Proceedings |
| Pages | 174-178 |
| Conference Date | MAY 24-25, 1996 |
| Conference Place | TSINGHUA UNIV, BEIJING, PEOPLES R CHINA |
| Keyword | Ultrafine Powder Sic Pcvd Oxidation Adsorption |
| URL | 查看原文 |
| Language | 英语 |
| Document Type | 会议论文 |
| Identifier | http://ir.ipe.ac.cn/handle/122111/11361 |
| Collection | 生化工程国家重点实验室 |
| Recommended Citation GB/T 7714 | Dai, X. G.,Zheng, G. L.,Rong, J. L.,et al. The oxidation behavior of ultrafine SiC particles prepared by PCVD[C],1996:174-178. |
| Files in This Item: | ||||||
| File Name/Size | DocType | Version | Access | License | ||
| The oxidation behavi（266KB） | 会议论文 | 限制开放 | CC BY-NC-SA | Application Full Text | ||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment