The oxidation behavior of ultrafine SiC particles prepared by PCVD | |
Dai, X. G.; Zheng, G. L.; Rong, J. L.; Wang, J. G. | |
1996 | |
Conference Name | 1996 China/Japan Symposium on Particuology |
Source Publication | '96 China-Japan Symposium on Particuology, Proceedings |
Pages | 174-178 |
Conference Date | MAY 24-25, 1996 |
Conference Place | TSINGHUA UNIV, BEIJING, PEOPLES R CHINA |
Keyword | Ultrafine Powder Sic Pcvd Oxidation Adsorption |
URL | 查看原文 |
Language | 英语 |
Document Type | 会议论文 |
Identifier | http://ir.ipe.ac.cn/handle/122111/11361 |
Collection | 生化工程国家重点实验室 |
Recommended Citation GB/T 7714 | Dai, X. G.,Zheng, G. L.,Rong, J. L.,et al. The oxidation behavior of ultrafine SiC particles prepared by PCVD[C],1996:174-178. |
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The oxidation behavi(266KB) | 会议论文 | 限制开放 | CC BY-NC-SA | Application Full Text |
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