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Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma
Lu, Chen1,2; Fan, Junmei1; Zhang, Yanchang1; Yuan, Fangli1; Yao, Mingshui3
2015-09-01
Source PublicationINTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY
ISSN1546-542X
Volume12Issue:5Pages:939-948
Abstract

Silicon nitride hollow quasi-spheres (SNHQSs) are prepared via a two-step method: producing micrometer-sized agglomerated granules with -Si3N4, and sintering additives of nano-alumina and nano-yttria by spray-drying and then hollowing the spray-dried granules (SDGs) by radio frequency thermal plasma sintering. Five kinds of slurry with different content of sintering additives are prepared for spray-drying, and the attained five kinds of SDGs have similar morphology and properties. However, different SDGs generate diverse hollow structures via plasma sintering. The cavity formation mechanism of the SNHQSs is deeply investigated. In addition, the obtained SNHQSs possess low apparent density (0.371-0.481g/mL), high compressive strength (up to 50MPa), and good thermal stability (up to 1600 degrees C), which will enable their promising applications in porous ceramics.

SubtypeArticle
WOS HeadingsScience & Technology ; Technology
DOI10.1111/ijac.12378
Indexed BySCI
Language英语
WOS KeywordMECHANICAL-PROPERTIES ; POWDERS ; PARTICLES ; SPHEROIDIZATION ; BETA-SI3N4 ; CERAMICS ; YTTRIA ; FLOW
WOS Research AreaMaterials Science
WOS SubjectMaterials Science, Ceramics
WOS IDWOS:000360979200004
Citation statistics
Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ipe.ac.cn/handle/122111/19533
Collection多相复杂系统国家重点实验室
Affiliation1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100190, Peoples R China
3.Chinese Acad Sci, Fujian Inst Res Struct Matter, State Key Lab Struct Chem, Beijing 100190, Peoples R China
Recommended Citation
GB/T 7714
Lu, Chen,Fan, Junmei,Zhang, Yanchang,et al. Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma[J]. INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,2015,12(5):939-948.
APA Lu, Chen,Fan, Junmei,Zhang, Yanchang,Yuan, Fangli,&Yao, Mingshui.(2015).Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma.INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY,12(5),939-948.
MLA Lu, Chen,et al."Preparation of Silicon Nitride Hollow Quasi-Spheres by RF Thermal Plasma".INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY 12.5(2015):939-948.
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