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Approaching the Hole Mobility Limit of GaSb Nanowires
Yang, Zai-xing1,2,3; Yip, Senpo1,2,3; Li, Dapan1,3; Han, Ning4; Dong, Guofa1,3; Liang, Xiaoguang1,3; Shu, Lei1; Hung, Tak Fu1; Mo, Xiaoliang5; Ho, Johnny C.1,2,3
Source PublicationACS NANO
AbstractIn recent years, high-mobility GaSb nanowires have received tremendous attention for high-performance p-type transistors; however, due to the difficulty in achieving thin and uniform nanowires (NWs), there is limited report until now addressing their diameter-dependent properties and their hole mobility limit in this important one-dimensional material system, where all these are essential information for the deployment of GaSb NWs in various applications. Here, by employing the newly developed surfactant-assisted chemical vapor deposition, high-quality and uniform GaSb NWs with controllable diameters, spanning from 16 to 70 nm, are successfully prepared, enabling the direct assessment of their growth orientation and hole mobility as a function of diameter while elucidating the role of sulfur surfactant and the interplay between surface and interface energies of NWs on their electrical properties. The sulfur passivation is found to efficiently stabilize the high-energy NW sidewalls of (111) and (311) in order to yield the thin NWs (i.e., <40 nm in diameters) with the dominant growth orientations of < 211 > and < 110 >, whereas the thick NWs (i.e., >40 nm in diameters) would grow along the most energy-favorable close-packed planes with the orientation of < 111 >, supported by the approximate atomic models. Importantly, through the reliable control of sulfur passivation, growth orientation and surface roughness, GaSb NWs with the peak hole mobility of similar to 400 cm(2)Vs(-1) for the diameter of 48 nm, approaching the theoretical limit under the hole concentration of similar to 2.2 x 10(18) cm(-3), can be achieved for the first time. All these indicate their promising potency for utilizations in different technological domains.
KeywordGasb Nanowires Surfactant-assisted Chemical Vapor Deposition Diameter Dependent Growth Orientation Hole Mobility
WOS HeadingsScience & Technology ; Physical Sciences ; Technology
Indexed BySCI
WOS Research AreaChemistry ; Science & Technology - Other Topics ; Materials Science
WOS SubjectChemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary
WOS IDWOS:000361935800066
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Document Type期刊论文
Affiliation1.City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon 999077, Hong Kong, Peoples R China
2.City Univ Hong Kong, State Key Lab Millimeter Waves, Kowloon 999077, Hong Kong, Peoples R China
3.City Univ Hong Kong, Shenzhen Res Inst, Shenzhen 518057, Peoples R China
4.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China
5.Fudan Univ, Dept Mat Sci, Shanghai 200433, Peoples R China
Recommended Citation
GB/T 7714
Yang, Zai-xing,Yip, Senpo,Li, Dapan,et al. Approaching the Hole Mobility Limit of GaSb Nanowires[J]. ACS NANO,2015,9(9):9268-9275.
APA Yang, Zai-xing.,Yip, Senpo.,Li, Dapan.,Han, Ning.,Dong, Guofa.,...&Ho, Johnny C..(2015).Approaching the Hole Mobility Limit of GaSb Nanowires.ACS NANO,9(9),9268-9275.
MLA Yang, Zai-xing,et al."Approaching the Hole Mobility Limit of GaSb Nanowires".ACS NANO 9.9(2015):9268-9275.
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