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Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts
Ren, Wenfeng1,2; Wang, Yanhong1; Zhang, Zailei1; Tan, Qiangqiang1; Zhong, Ziyi3; Su, Fabing1
2016
Source PublicationAPPLIED SURFACE SCIENCE
ISSN0169-4332
Volume360Issue:JANPages:192-197
AbstractDespite the promising application of patterned Si wafers (PSWs) in electrochemistry and photochemistry, the simple and environment-friendly fabrication of these PSWs is still a great challenge. Herein, we report a novel method for fabrication of PSWs via Rochow reaction, which is commonly used to produce organosilane monomers for synthesizing organosilane products in chemical industry. In this reaction, commercial Si wafers (SWs) reacted with gas CH3Cl over patterned various Cu-based catalyst to create regular patterns. PSWs were obtained after removal of Cu compounds followed with facile post treatment. Because of simplicity, low-cost and low-toxicity of this approach, the manufacture of PSWs on an industrial scale is highly possible, which can be realized by integrating the organosilane synthesis process and controlling the reaction conditions. (C) 2015 Elsevier B.V. All rights reserved.
KeywordSi Wafers Direct-pattern Rochow Reaction Copper Catalysts Ch3cl
SubtypeArticle
WOS HeadingsScience & Technology ; Physical Sciences ; Technology
DOI10.1016/j.apsusc.2015.10.233
Indexed BySCI
Language英语
WOS KeywordSOLAR-CELLS ; FABRICATION ; NANOWIRES ; LITHOGRAPHY ; LITHIUM ; SYSTEM ; ARRAYS ; MASK
WOS Research AreaChemistry ; Materials Science ; Physics
WOS SubjectChemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
Funding OrganizationNational Natural Science Foundation of China(51272252 ; Hundred Talents Program of the Chinese Academy of Sciences ; 51402302 ; 51402299)
WOS IDWOS:000366591200024
Citation statistics
Cited Times:2[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.ipe.ac.cn/handle/122111/20180
Collection多相复杂系统国家重点实验室
Affiliation1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
3.ASTAR, Inst Chem Engn & Sci, Jurong Isl 627833, Singapore
Recommended Citation
GB/T 7714
Ren, Wenfeng,Wang, Yanhong,Zhang, Zailei,et al. Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts[J]. APPLIED SURFACE SCIENCE,2016,360(JAN):192-197.
APA Ren, Wenfeng,Wang, Yanhong,Zhang, Zailei,Tan, Qiangqiang,Zhong, Ziyi,&Su, Fabing.(2016).Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts.APPLIED SURFACE SCIENCE,360(JAN),192-197.
MLA Ren, Wenfeng,et al."Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts".APPLIED SURFACE SCIENCE 360.JAN(2016):192-197.
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