CAS OpenIR
Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor
Guo, Junjie1,2; Yang, Yafeng1; Zhu, Qingshan1,2; Fan, Chuanlin1; Lv, Pengpeng1; Xiang, Maoqiao1
2018-11-15
Source PublicationSURFACE & COATINGS TECHNOLOGY
ISSN0257-8972
Volume353Pages:18-24
Abstract

The metallic Ti film was successfully deposited on the metal substrates at a temperature as low as 620 degrees C by developing a novel TiCl2 precursor of chemical vapor deposition (CVD) from a Ti-TiCl4 system, much lower than 1140 degrees C and 1200 degrees C reported. This is mainly attributed to the unique sublimation and decomposition of TiCl2 at 620 degrees C. Increasing the deposition temperature above the evaporation temperature of 750 degrees C accelerated the formation of denser and thicker Ti film. A nearly fully dense Ni-Ti intermetallic film was obtained on the 316 L substrate at 800 degrees C. This remarkably improves the corrosion resistance of 316 L steel, nearly tripled the pitting potential of deposited 316 L steel. Meanwhile, the microstructure of the 316 L matrix hardly changed, and unexpectedly a strong metallurgical bonding was formed between the deposited layer and substrate due to the minor diffusion of Ni and Fe into Ti film.

KeywordCvd Metallic Ti Film Ticl2 Sublimation Corrosion Resistance Metallurgical Bonding
DOI10.1016/j.surfcoat.2018.08.064
Language英语
WOS KeywordMagnetron-sputtered Ti ; 316l Stainless-steel ; Corrosion Behavior ; Passivity Breakdown ; Nacl Solution ; Sic Fiber ; Niti ; Alloys
Funding ProjectNational Natural Science Foundation of China[21736010] ; National Natural Science Foundation of China[51602313] ; Key Research Program of Frontier Sciences, Chinese Academy of Sciences[QYZDB-SSW-JSC045] ; National Youth Thousand Plan Program ; Center for Mesoscience, Institute of Process Engineering, Chinese Academy of Sciences[COM2016A002]
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Coatings & Films ; Physics, Applied
Funding OrganizationNational Natural Science Foundation of China ; Key Research Program of Frontier Sciences, Chinese Academy of Sciences ; National Youth Thousand Plan Program ; Center for Mesoscience, Institute of Process Engineering, Chinese Academy of Sciences
WOS IDWOS:000447117400003
PublisherELSEVIER SCIENCE SA
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ipe.ac.cn/handle/122111/26229
Collection中国科学院过程工程研究所
Corresponding AuthorYang, Yafeng; Zhu, Qingshan
Affiliation1.Chinese Acad Sci, Inst Proc Engn, State Key Lab Multiphase Complex Syst, Beijing 100190, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
Recommended Citation
GB/T 7714
Guo, Junjie,Yang, Yafeng,Zhu, Qingshan,et al. Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor[J]. SURFACE & COATINGS TECHNOLOGY,2018,353:18-24.
APA Guo, Junjie,Yang, Yafeng,Zhu, Qingshan,Fan, Chuanlin,Lv, Pengpeng,&Xiang, Maoqiao.(2018).Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor.SURFACE & COATINGS TECHNOLOGY,353,18-24.
MLA Guo, Junjie,et al."Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor".SURFACE & COATINGS TECHNOLOGY 353(2018):18-24.
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