chemicalvapordepositionofsicatdifferentmolarratiosofhydrogentomethyltrichlorosilane

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	chemicalvapordepositionofsicatdifferentmolarratiosofhydrogentomethyltrichlorosilane
	YANG Yan; ZHANG Weigang
	2009
Source Publication	journalofcentralsouthuniversityoftechnology
ISSN	1005-9784
Volume	16 Issue:5 Pages:730
Abstract	Chemical vapor deposition (CVD) of SiC from methyltrichlorosilane (NITS) was studied at two different molar ratios of H-2 to MTS (n(H-2)/n(MTS)). The total pressure was kept as 100 kPa and the temperature was varied from 850 to 1100 degrees C at a total residence time of 1 s. Steady-state deposition rates as functions of reactor length and of temperature, investigated at different n(H-2)/n(MTS) values, show that hydrogen exhibits strongly influences on the deposition rate. Especially, the deposition of Si co-deposit can be obtained in broader substrate length and at higher temperatures with increasing hydrogen partial pressure. Influence of hydrogen on the deposition process was also studied using gas phase composition and deposit composition analysis at various n(H-2)/n(MTS). SEM micrographs directly show the variation of surface morphologies at various n(H-2)/n(MTS). It can be found that the crystal grain of the deposit at 1100 degrees C is better developed and the crystallization is also improved with increasing n(H-2)/n(MTS).
Language	英语
Funding Project	[Chinese Academy of Sciences]
Document Type	期刊论文
Identifier	http://ir.ipe.ac.cn/handle/122111/32241
Collection	中国科学院过程工程研究所
Affiliation	中国科学院过程工程研究所
First Author Affilication	中国科学院过程工程研究所
Recommended Citation GB/T 7714	YANG Yan,ZHANG Weigang. chemicalvapordepositionofsicatdifferentmolarratiosofhydrogentomethyltrichlorosilane[J]. journalofcentralsouthuniversityoftechnology,2009,16(5):730.
APA	YANG Yan,&ZHANG Weigang.(2009).chemicalvapordepositionofsicatdifferentmolarratiosofhydrogentomethyltrichlorosilane.journalofcentralsouthuniversityoftechnology,16(5),730.
MLA	YANG Yan,et al."chemicalvapordepositionofsicatdifferentmolarratiosofhydrogentomethyltrichlorosilane".journalofcentralsouthuniversityoftechnology 16.5(2009):730.

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