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| Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents | |
| Wang, Jing1,2; Li, Lei1; Cao, Hongbin1; Yang, Chuanfang1; Guo, Zhuang1,2; Shi, Yanchun1; Li, Wangliang1; Zhao, He1; Sun, Jiajun1,2; Xie, Yongbing1 | |
| 2020-04-01 | |
| Source Publication | CHEMICAL ENGINEERING JOURNAL
 |
| ISSN | 1385-8947 |
| Volume | 385Pages:10 |
| Abstract | The degradation of a series of phenolic compounds in a novel dielectric barrier discharge (DBD) plasma reactor was studied in this paper. The effect of various parameters, such as applied voltage, water flowrate, initial concentrations of organics, solution conductivity and pH, was investigated to achieve a high removal efficiency for phenolic compounds. The complete degradation of p-CH3 could be achieved within 32 min, and the highest energy yield was about 3.5 g/kWh. Electron paramagnetic resonance analysis and radical quenching experiment indicated that center dot OH played an important role in phenols degradation, along with ozone molecules. center dot O-2(-) and O-1(2) also possibly contributed to phenols degradation. Substituted phenols were more easily degraded, especially nitrophenol with strong electron withdrawing groups, originating from center dot OH and center dot O-2(-) attack. The intermediates of different phenolic compound generated in the degradation process were identified by Mass spectroscopy (MS) and the corresponding mechanism were proposed to strengthen the understanding of mechanism. A DBD plasma and activated carbon combined technique is further proposed to promote the conversion of oxygen into ROS (reactive oxygen species) and enhance the mineralization rate of substituted phenols. |
| Keyword | Dielectric barrier discharge Plasma Phenolic compound Substituents Operating parameters |
| DOI | 10.1016/j.cej.2019.123732 |
| Language | 英语 |
| WOS Keyword | DISCHARGE NONTHERMAL PLASMA ; AQUEOUS-SOLUTION ; ELECTRICAL-DISCHARGE ; CATALYTIC OZONATION ; METHYLENE-BLUE ; WATER ; REMOVAL ; MECHANISM ; REACTOR ; OXIDATION |
| Funding Project | Major Science and Technology Program for Water Pollution Control and Treatment[2017ZX07402001] ; National Science Fund for Distinguished Young Scholars of China[51425405] |
| WOS Research Area | Engineering |
| WOS Subject | Engineering, Environmental ; Engineering, Chemical |
| Funding Organization | Major Science and Technology Program for Water Pollution Control and Treatment ; National Science Fund for Distinguished Young Scholars of China |
| WOS ID | WOS:000507465200046 |
| Publisher | ELSEVIER SCIENCE SA |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ipe.ac.cn/handle/122111/38875 |
| Collection | 中国科学院过程工程研究所 |
| Corresponding Author | Yang, Chuanfang; Xie, Yongbing |
| Affiliation | 1.Chinese Acad Sci, Beijing Engn Res Ctr Proc Pollut Control, Inst Proc Engn, CAS Key Lab Green Proc & Engn, Beijing 100190, Peoples R China 2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China |
| Recommended Citation GB/T 7714 | Wang, Jing,Li, Lei,Cao, Hongbin,et al. Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents[J]. CHEMICAL ENGINEERING JOURNAL,2020,385:10. |
| APA | Wang, Jing.,Li, Lei.,Cao, Hongbin.,Yang, Chuanfang.,Guo, Zhuang.,...&Xie, Yongbing.(2020).Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents.CHEMICAL ENGINEERING JOURNAL,385,10. |
| MLA | Wang, Jing,et al."Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents".CHEMICAL ENGINEERING JOURNAL 385(2020):10. |
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