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Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents
Wang, Jing1,2; Li, Lei1; Cao, Hongbin1; Yang, Chuanfang1; Guo, Zhuang1,2; Shi, Yanchun1; Li, Wangliang1; Zhao, He1; Sun, Jiajun1,2; Xie, Yongbing1
2020-04-01
Source PublicationCHEMICAL ENGINEERING JOURNAL
ISSN1385-8947
Volume385Pages:10
AbstractThe degradation of a series of phenolic compounds in a novel dielectric barrier discharge (DBD) plasma reactor was studied in this paper. The effect of various parameters, such as applied voltage, water flowrate, initial concentrations of organics, solution conductivity and pH, was investigated to achieve a high removal efficiency for phenolic compounds. The complete degradation of p-CH3 could be achieved within 32 min, and the highest energy yield was about 3.5 g/kWh. Electron paramagnetic resonance analysis and radical quenching experiment indicated that center dot OH played an important role in phenols degradation, along with ozone molecules. center dot O-2(-) and O-1(2) also possibly contributed to phenols degradation. Substituted phenols were more easily degraded, especially nitrophenol with strong electron withdrawing groups, originating from center dot OH and center dot O-2(-) attack. The intermediates of different phenolic compound generated in the degradation process were identified by Mass spectroscopy (MS) and the corresponding mechanism were proposed to strengthen the understanding of mechanism. A DBD plasma and activated carbon combined technique is further proposed to promote the conversion of oxygen into ROS (reactive oxygen species) and enhance the mineralization rate of substituted phenols.
KeywordDielectric barrier discharge Plasma Phenolic compound Substituents Operating parameters
DOI10.1016/j.cej.2019.123732
Language英语
WOS KeywordDISCHARGE NONTHERMAL PLASMA ; AQUEOUS-SOLUTION ; ELECTRICAL-DISCHARGE ; CATALYTIC OZONATION ; METHYLENE-BLUE ; WATER ; REMOVAL ; MECHANISM ; REACTOR ; OXIDATION
Funding ProjectMajor Science and Technology Program for Water Pollution Control and Treatment[2017ZX07402001] ; National Science Fund for Distinguished Young Scholars of China[51425405]
WOS Research AreaEngineering
WOS SubjectEngineering, Environmental ; Engineering, Chemical
Funding OrganizationMajor Science and Technology Program for Water Pollution Control and Treatment ; National Science Fund for Distinguished Young Scholars of China
WOS IDWOS:000507465200046
PublisherELSEVIER SCIENCE SA
Citation statistics
Document Type期刊论文
Identifierhttp://ir.ipe.ac.cn/handle/122111/38875
Collection中国科学院过程工程研究所
Corresponding AuthorYang, Chuanfang; Xie, Yongbing
Affiliation1.Chinese Acad Sci, Beijing Engn Res Ctr Proc Pollut Control, Inst Proc Engn, CAS Key Lab Green Proc & Engn, Beijing 100190, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
Recommended Citation
GB/T 7714
Wang, Jing,Li, Lei,Cao, Hongbin,et al. Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents[J]. CHEMICAL ENGINEERING JOURNAL,2020,385:10.
APA Wang, Jing.,Li, Lei.,Cao, Hongbin.,Yang, Chuanfang.,Guo, Zhuang.,...&Xie, Yongbing.(2020).Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents.CHEMICAL ENGINEERING JOURNAL,385,10.
MLA Wang, Jing,et al."Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents".CHEMICAL ENGINEERING JOURNAL 385(2020):10.
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