Knowledge Management System Of Institute of process engineering,CAS
| Role of Oxygen Potential and Oxygen Ions on Phosphorus Removal from Silicon via Addition of FeO into Slag | |
| Zhang, Nan1,2; Qian, Guoyu1; Wang, Zhi1; Wei, Kuixian3; Ma, Wenhui3; Gong, Wei2 | |
| 2020-05-01 | |
| Source Publication | SILICON
 |
| ISSN | 1876-990X |
| Volume | 12Issue:5Pages:1145-1156 |
| Abstract | In present work, the role of the oxygen potential (P-O2) and oxygen ion (O2-) concentration for removing phosphorus (P) during CaO-SiO2-Al2O3-FexO slag refining was studied by on-line measurement of oxygen activity in molten silicon (Si), FactSage calculation, Raman spectroscopy and nuclear magnetic resonance (NMR) spectroscopy. The results show that the addition of FeO from 0 to 9.25 wt% in slag can increase the activity of dissolved oxygen (a([O])) in Si and the mole fraction of O2- in slag. Moreover, the increase of O2- concentration leads to the increase of non-bridge oxygen (NBO). The value of L-P (the partition ratio of phosphorous between slag and Si shows a first increase and then decrease trend and reaches a maximum value of 1.95 at 5 +/- 0.1 wt% FeO. It is believed that the increase of a([O]) and NBO can promote the removal of P as FeO content is less than 5 +/- 0.1 wt%. the chain structure unit (Q(2)) of silicate network as the main intermediate structure to capture PO43- from the charge compensation of P2O5 by O2- to form the sheet structure unit Q(3)(Si and P). When FeO content is increased to more than 5 +/- 0.1 wt%, L-P value gradually decreases although the values of NBO and a([O]) are increasing. NBO plays a leading role in this process, it can be speculated that more NBO can depolymerize the Q(3) (Si and P) to destroy the stability of P in silicate network. As a result, a mount of PO43- is present at the interface to prevent the oxidation of phosphorous, which leads to the decrease of L-P value. |
| Keyword | Solar grade silicon Slag refining P removal Oxygen potential Raman and NMR spectroscopy |
| DOI | 10.1007/s12633-019-00201-w |
| Language | 英语 |
| WOS Keyword | METALLURGICAL-GRADE SILICON ; KERF LOSS SILICON ; DIAMOND-WIRE SAW ; BORON REMOVAL ; SLURRY WASTE ; POWDER ; IRON ; CAO-SIO2 ; RAMAN ; NMR |
| WOS Research Area | Chemistry ; Materials Science |
| WOS Subject | Chemistry, Physical ; Materials Science, Multidisciplinary |
| WOS ID | WOS:000527302800015 |
| Publisher | SPRINGER |
| Citation statistics | |
| Document Type | 期刊论文 |
| Identifier | http://ir.ipe.ac.cn/handle/122111/40920 |
| Collection | 中国科学院过程工程研究所 |
| Corresponding Author | Wang, Zhi |
| Affiliation | 1.Chinese Acad Sci, Inst Proc Engn, Key Lab Green Proc & Engn, Natl Engn Lab Hydromet Cleaner Prod Technol, Beijing 100190, Peoples R China 2.Northeastern Univ, Sch Met, Ferrous Met Dept, Shenyang 110819, Liaoning, Peoples R China 3.Kunming Univ Sci & Technol, Fac Met & Energy Engn, Kunming 650093, Yunnan, Peoples R China |
| Recommended Citation GB/T 7714 | Zhang, Nan,Qian, Guoyu,Wang, Zhi,et al. Role of Oxygen Potential and Oxygen Ions on Phosphorus Removal from Silicon via Addition of FeO into Slag[J]. SILICON,2020,12(5):1145-1156. |
| APA | Zhang, Nan,Qian, Guoyu,Wang, Zhi,Wei, Kuixian,Ma, Wenhui,&Gong, Wei.(2020).Role of Oxygen Potential and Oxygen Ions on Phosphorus Removal from Silicon via Addition of FeO into Slag.SILICON,12(5),1145-1156. |
| MLA | Zhang, Nan,et al."Role of Oxygen Potential and Oxygen Ions on Phosphorus Removal from Silicon via Addition of FeO into Slag".SILICON 12.5(2020):1145-1156. |
| Files in This Item: | There are no files associated with this item. | |||||
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment