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Wettability and reactivity of molten silicon with various substrates
Alternative TitleAppl. Phys. A-Mater. Sci. Process.
Yuan, Z; Huang, WL; Mukai, K
2004-03-01
Source PublicationAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN0947-8396
Volume78Issue:4Pages:617-622
AbstractContact angles of molten silicon on various substrates have been determined using the sessile drop method and reactivity has been investigated by examining cross sections between silicon and substrates with an electron-probe microanalyzer (EPMA). The contact angles between molten silicon and oxide substrates, such as SiO2(s), Al2O3(s) and MgO(s), are in the range 85degrees to 88degrees. The reaction zone is composed of forsterite (2MgO.SiO2) and clinoenstatite (2MgO.2SiO(2)) on the MgO(s)-side of the interface between the Si and MgO. The contact angle between molten silicon and Si3N4 is about 90degrees. Molten silicon spreads over the SiC plate and the contact angle is estimated to be 8degrees. Large contact-angle values (around 145degrees) have been observed on BN substrates. At the interface between Si(l) and the BN substrate, a discontinuous Si3N4 layer is believed to form and might retard the dissolution of BN into molten silicon. The BN substrate is regarded as being the most suitable substrate for supporting a molten silicon drop during surface tension measurements, due to the large contact angle and low contamination.; Contact angles of molten silicon on various substrates have been determined using the sessile drop method and reactivity has been investigated by examining cross sections between silicon and substrates with an electron-probe microanalyzer (EPMA). The contact angles between molten silicon and oxide substrates, such as SiO2(s), Al2O3(s) and MgO(s), are in the range 85degrees to 88degrees. The reaction zone is composed of forsterite (2MgO.SiO2) and clinoenstatite (2MgO.2SiO(2)) on the MgO(s)-side of the interface between the Si and MgO. The contact angle between molten silicon and Si3N4 is about 90degrees. Molten silicon spreads over the SiC plate and the contact angle is estimated to be 8degrees. Large contact-angle values (around 145degrees) have been observed on BN substrates. At the interface between Si(l) and the BN substrate, a discontinuous Si3N4 layer is believed to form and might retard the dissolution of BN into molten silicon. The BN substrate is regarded as being the most suitable substrate for supporting a molten silicon drop during surface tension measurements, due to the large contact angle and low contamination.
KeywordLiquid Pure Metals Surface-tension Oxygen Solubility Aluminum Boron Sio2
SubtypeArticle
WOS HeadingsScience & Technology ; Technology ; Physical Sciences
DOI10.1007/s00339-002-2001-8
URL查看原文
Indexed BySCI
Language英语
WOS KeywordLIQUID PURE METALS ; SURFACE-TENSION ; OXYGEN SOLUBILITY ; ALUMINUM ; BORON ; SIO2
WOS Research AreaMaterials Science ; Physics
WOS SubjectMaterials Science, Multidisciplinary ; Physics, Applied
WOS IDWOS:000188347700035
Citation statistics
Cited Times:53[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Version出版稿
Identifierhttp://ir.ipe.ac.cn/handle/122111/5036
Collection研究所(批量导入)
Affiliation1.Chinese Acad Sci, Inst Proc Engn, Multiphase React Lab, Beijing 100080, Peoples R China
2.Kyushu Inst Technol, Fac Engn, Dept Mat Sci & Engn, Kitakyushu, Fukuoka 8048550, Japan
Recommended Citation
GB/T 7714
Yuan, Z,Huang, WL,Mukai, K. Wettability and reactivity of molten silicon with various substrates[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2004,78(4):617-622.
APA Yuan, Z,Huang, WL,&Mukai, K.(2004).Wettability and reactivity of molten silicon with various substrates.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,78(4),617-622.
MLA Yuan, Z,et al."Wettability and reactivity of molten silicon with various substrates".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 78.4(2004):617-622.
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