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Microstructure and surface topography of aluminum films deposited on glass microspheres in a fluidized bed CVD reactor
Alternative TitleChem. J. Chin. Univ.-Chin.
Liu, SQ; Shi, DX; Cui, YH; Cao, ZY
2000-03-01
Source PublicationCHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE
ISSN0251-0790
Volume21Issue:3Pages:339-343
AbstractIn this paper, we investigate the influences of deposition temperature and time on microstructure and surface topography of the aluminum films deposited on glass microspheres of higher refractive index by thermal decomposition of tri-isobutyl aluminum in a fluidized bed CVD reactor at atmospheric pressure, SEM examination of surface topography of the films shows that under the same conditions, the increase of deposition temperature causes the aluminum films to change from 3-dimensional hillock formation to non-specular, rough structure with steep peeks and valleys to uniform and smooth surface; and while extending the deposition time at certain temperatures, the grains become larger and surface roughness becomes distinct, The results demonstrate that by means of thermal activation at appropriately elevated temperatures (350 similar to 390 degrees C) for a certain period of time (about 30 min), it is possible to provide smooth and uniform aluminum films on the surface of glass microspheres which may approximately conform with the requirements of retro-reflective materials. Auger spectra for examining the surface chemical composition reveal that the preferred higher temperature used to obtain smooth topography does not introduce obvious contamination by carbon residues, but diffusion of Ti and Ba from substrates toward aluminum film occurs to some extent, which may be another factor to cause the activation of the substrate and to obtain smooth and uniform aluminum film on glass microspheres in this study. In order to further improve and control microstructure and surface topography of the aluminum films, it is necessary to adopt other appropriate activation process combined with thermal activation.; In this paper, we investigate the influences of deposition temperature and time on microstructure and surface topography of the aluminum films deposited on glass microspheres of higher refractive index by thermal decomposition of tri-isobutyl aluminum in a fluidized bed CVD reactor at atmospheric pressure, SEM examination of surface topography of the films shows that under the same conditions, the increase of deposition temperature causes the aluminum films to change from 3-dimensional hillock formation to non-specular, rough structure with steep peeks and valleys to uniform and smooth surface; and while extending the deposition time at certain temperatures, the grains become larger and surface roughness becomes distinct, The results demonstrate that by means of thermal activation at appropriately elevated temperatures (350 similar to 390 degrees C) for a certain period of time (about 30 min), it is possible to provide smooth and uniform aluminum films on the surface of glass microspheres which may approximately conform with the requirements of retro-reflective materials. Auger spectra for examining the surface chemical composition reveal that the preferred higher temperature used to obtain smooth topography does not introduce obvious contamination by carbon residues, but diffusion of Ti and Ba from substrates toward aluminum film occurs to some extent, which may be another factor to cause the activation of the substrate and to obtain smooth and uniform aluminum film on glass microspheres in this study. In order to further improve and control microstructure and surface topography of the aluminum films, it is necessary to adopt other appropriate activation process combined with thermal activation.
KeywordFluidized Bed Cvd Reactor Triisobutyl Aluminum Aluminum Deposition Microstructure And Surface Topography Glass Microspheres Of High Refractive Index Thermal Activation
SubtypeArticle
WOS HeadingsScience & Technology ; Physical Sciences
URL查看原文
Indexed BySCI
Language英语
WOS KeywordCHEMICAL VAPOR-DEPOSITION ; TRIISOBUTYLALUMINUM ; LPCVD
WOS Research AreaChemistry
WOS SubjectChemistry, Multidisciplinary
WOS IDWOS:000085910500003
Citation statistics
Cited Times:3[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Version出版稿
Identifierhttp://ir.ipe.ac.cn/handle/122111/5993
Collection研究所(批量导入)
AffiliationChinese Acad Sci, Inst Chem Met, Beijing 100080, Peoples R China
Recommended Citation
GB/T 7714
Liu, SQ,Shi, DX,Cui, YH,et al. Microstructure and surface topography of aluminum films deposited on glass microspheres in a fluidized bed CVD reactor[J]. CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,2000,21(3):339-343.
APA Liu, SQ,Shi, DX,Cui, YH,&Cao, ZY.(2000).Microstructure and surface topography of aluminum films deposited on glass microspheres in a fluidized bed CVD reactor.CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,21(3),339-343.
MLA Liu, SQ,et al."Microstructure and surface topography of aluminum films deposited on glass microspheres in a fluidized bed CVD reactor".CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE 21.3(2000):339-343.
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