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二氧化锆电泳沉积膜的致密化烧结
卢立柱; 胡湖生; 谢慧琴
1998
Source Publication材料科学与工艺
Issue01Pages:1-4+12
Abstract研究了钇稳定二氧化锆(8YSZ)微粉在金属陶瓷Ni-8YSZ基片和基管上的电泳沉积膜的致密化烧结过程。烧结收缩率△L/L随温度T的增高而增大,在1100~1300℃期间,收缩率随温度增加而急剧增加。重复沉积-烧结2次即可达到基本不漏气,每次重复增加厚度约为13μm。烧结后的8YSZ的晶型仍是稳定立方相。1440℃烧结2h的8YSZ薄膜硬度为4.33GPa,与文献报道的块体8YSZ硬度值相近,并且在1000℃时具有12.2S/m的0-2电导率和1.09eV的0-2电导激活能。
Keyword电泳 薄膜 烧结 钇稳定二氧化锆
Document Type期刊论文
Version出版稿
Identifierhttp://ir.ipe.ac.cn/handle/122111/7569
Collection研究所(批量导入)
Recommended Citation
GB/T 7714
卢立柱,胡湖生,谢慧琴. 二氧化锆电泳沉积膜的致密化烧结[J]. 材料科学与工艺,1998(01):1-4+12.
APA 卢立柱,胡湖生,&谢慧琴.(1998).二氧化锆电泳沉积膜的致密化烧结.材料科学与工艺(01),1-4+12.
MLA 卢立柱,et al."二氧化锆电泳沉积膜的致密化烧结".材料科学与工艺 .01(1998):1-4+12.
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