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铬酸钠溶液中微量铝硅杂质的脱除
郭为; 余志辉; 王京刚; 曲景奎; 齐涛; 韩晓英
2011
Source Publication过程工程学报
Issue04Pages:590-594
Abstract采用铝硅含量分别为189.65和51.08mg/L的铬酸钠配制溶液,通过常压和高压反应脱除杂质微量铝硅.常压下加入偏铝酸钠调节体系铝硅元素比为6,无需CaO添加剂,60℃下反应40min,几乎可完全脱除杂质硅;在高压釜中通过调节CO2压力为0.4MPa,60℃下反应20min,几乎能完全脱除杂质铝.化学纯铬酸钠脱除铝硅杂质后能达到分析纯级别.高压釜内脱铝的同时铬酸钠发生碳化反应,溶液pH值随反应进行逐渐降低,趋于稳定,显示碳化反应近于平衡.
Keyword铬酸钠 偏铝酸钠 脱硅 脱铝 常压 高压
Document Type期刊论文
Version出版稿
Identifierhttp://ir.ipe.ac.cn/handle/122111/9926
Collection研究所(批量导入)
Recommended Citation
GB/T 7714
郭为,余志辉,王京刚,等. 铬酸钠溶液中微量铝硅杂质的脱除[J]. 过程工程学报,2011(04):590-594.
APA 郭为,余志辉,王京刚,曲景奎,齐涛,&韩晓英.(2011).铬酸钠溶液中微量铝硅杂质的脱除.过程工程学报(04),590-594.
MLA 郭为,et al."铬酸钠溶液中微量铝硅杂质的脱除".过程工程学报 .04(2011):590-594.
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